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We report the ablation of 200 nm-top wide (130 nm FWHM) trenches on PMMA photoresist by focusing the extreme ultraviolet output from a table-top capillary discharge laser with a Fresnel zone plate lens.
Table top nano-holography with EUV laser was demonstrated. The hologram was recorded in a photoresist and digitized with an AFM. The image was reconstructed achieving 164 nm lateral resolution determined using wavelet analysis and image correlation.
Table top holography with EUV laser was demonstrated. The hologram recorded in a photoresist was digitized with an AFM. The image was reconstructed achieving 380 nm spatial resolution determined using wavelet analysis and image correlation.
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