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This work represents a comparative study of gas‐phase parameters and reactive‐ion etching kinetics for Si and Si and SiO2 in CF4 + O2 and C6F12O + O2 plasmas. An interest to the C6F12O gas is because it combines the low global warming potential (low environmental impact) and weakly studied dry etching performance. It was shown that the investigated gas systems showed similar effects of processing...
We herein report our investigation into the effect of plasma-induced surface modification of a polyethylene terephthalate (PET) surface on the output performance of a triboelectric generator (TEG). The PET surface was subjected to plasma treatment using a CF4/CH4/Ar gas mixture (25–75% CF4) to increase the surface roughness and triboelectric charge density. Plasma diagnostics were then performed using...
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