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Monitoring basic plasma parameters such as temperature (T), density (n), floating potential (V f ) or Debye length (λ d ) provides vital knowledge during the ion implantation processing of materials immersed in plasmas (PIII or PSII) generated either by DC or (13.56MHz) RF sources. Thus, a fully automated electromechanical system has been designed and constructed on the basis of guard...
Optimal surface nitriding is closely related to plasma chemical composition. The effects of Plasma-Immersion Ion Implantation (PIII) nitriding with 15% N 2 +85% H 2 type mixtures have been studied. A simplified PIII facility was assembled around an evacuated Pyrex cylindrical 500 mm long reactor with a 190 mm inner diameter, over which a 3.2 mm wide antenna was coaxially wound with...
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