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This paper introduces the Taguchi method for the optimization of measurement conditions in critical dimension-scanning electron microscope (CD-SEM). As a result, four parameter conditions are optimized for low resist shrinkage and highly precise measurement through eighteen experiments. The prediction accuracy is under 0.2 nm. Moreover, high prediction accuracy is obtained for three different ArF...
This paper reviews and introduces recent methods for enhancing the performance of cell-projection lithography and describes various useful applications of this type of lithography. To increase the throughput, the area of the e-beam mask that is available for cell apertures was four-times increased. For enhanced lithographic resolution, the resolution in cell-beam measurement was enhanced. The method...
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