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A complete floating double probe technique is used to measure the ion density and electron temperature in a dual frequency capacitively coupled plasma for argon discharges. It has been shown that there is an obvious modulating effect of the high- and low-frequency powers on the plasma parameters and their spatial distributions. In addition, the influence of the discharge gap on the ion density and...
Capacitively coupled plasmas (CCPs) have been widely used in thin film deposition and etching in a variety of industries such as those of semi-conductor/microelectronics, flat panel displays and solar-cell panels. In all these applications, to produce uniform plasmas over large surface areas is highly desired, as it not only improves the efficiency of manufacturing but also reduces the defects of...
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