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Magnetic Heusler alloys that benefit from their half-metal characteristics have recently seen significant progresses in material researches and process development. As a result, current perpendicular to plane (CPP) giant magnetoresistance (GMR) has been proportionally enhanced, at least but not limited, by an order of magnitude in devices that contain such magnetic Heusler alloys and all-metal layer...
A robust poly opening polish (POP) CMP for replacement metal gate (RMG) application has been developed to meet the criteria of High-k metal gate (HKMG) devices at 28nm technology node. From the previous performance of POP CMP, the uniformity and loading was an important factor of product with HKMG. The polish rate and selective of platen 2, which were key physical characters, was taken to study by...
This paper reports on the successful demonstration of radio frequency (RF) components in support of an integrated wide band/high dynamic range X-band receiver in 180-nm fully-depleted (FD) SOI CMOS technology. The demonstrated microwave monolithic integrated circuit (MMIC) includes an X-band low noise amplifier (LNA), Marchand balun, balanced amplifiers, double balanced mixer, non-reflective filter,...
A high performance 22/20nm CMOS bulk FinFET achieves the best in-class N/P Ion values of 1200/1100 μA/μm for Ioff=100nA/μm at 1V. Excellent device electrostatic control is demonstrated for gate length (Lgate) down to 20nm. Dual-Epitaxy and multiple stressors are essential to boost the device performance. Dual workfunction (WF) with an advanced High-K/Metal gate (HK/MG) stack is deployed in an integration-friendly...
The technology of Radio Frequency Identification (RFID) has been used to speed up the tracking process as well as to increase the efficiency of the product management process in various industries. In developing RFID solution, the core of all the questions is how to design high performance and suitable RFID tags for practical applications. However, since RFID tags are directly attached to objects,...
This paper presents the first 150 GHz amplifier in a digital 65 nm CMOS technology. Design techniques to preserve raw transistor gain near fmax include layout optimization, dummy-prefilled microstrip lines (MSL) for design-rule compliance, and matching topologies which minimize passive element losses. To the authors' knowledge, the measured 8.3 dB gain, 6.3 dBm saturated output power (Psat), 1.5 dBm...
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