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Secondary ion mass spectrometry (SIMS), X‐ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) represent three surface analysis techniques heavily used in the complementary metal oxide semiconductor (CMOS) industry. The maturity of these techniques is demonstrated by (a) the diversity of lab‐based instruments used in research and development (R&D) as well as to support fab‐related...
The trend towards an increased importance of distributed (renewable) energy resources characterized by intermittent operation redefines the energy landscape. The stochastic nature of the energy systems on the supply side requires increased flexibility at the demand side. We present a model that determines the theoretical maximum of flexibility of a combined heat and power system coupled to a thermal...
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