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This paper presents a novel post-process gap reduction technique for high aspect ratio microstructures. The gap reduction procedure is based on electrostatic deflection of a movable microstructure and micro welding for permanently locking the final position. The gap reduction technique is demonstrated for MEMS devices fabricated by the air gap insulated microstructures technology. The functional principle...
This paper presents a novel post-process gap reduction technology of high aspect ratio microstructures. The gap reduction procedure uses the well known electrostatic deflection of a movable microstructure. In contrast to other solutions, micro welding is utilized to create the final, permanent locking. The fabrication technology, the functional principle of the gap reduction mechanism and the experimental...
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