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Thermal scanning probe lithography (t-SPL) has demonstrated unique capabilities for maskless lithography. A heated atomic force microscope tip is used to locally remove a thermally sensitive resist. This process is able to fabricate precise 3D patterns and high resolution structures without the use of charged particles, such as electrons, which have been implicated in substrate damage. Here we outline...
We used electroless deposition to fabricate clusters of silver nanoparticles (NPs) on a silicon substrate. These clusters are plasmonics devices that induce giant electromagnetic (EM) field increments. When those EM field are absorbed by the metal NPs clusters generate, in turn, severe temperature increases. Here, we used the laser radiation of a conventional Raman set-up to transfer geometrical patterns...
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