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To control deposition profile of carbon films in trenches, we have studied substrate temperature dependence of deposition rate of carbon films and we have realized anisotropic deposition of carbon films in trenches above 250° deposited by CVD plasma of toluene diluted H2, in trenches. Here, we report dependence of properties of plasma CVD carbon films on substrate temperature.
Summary form only given. Amorphous hydrogenated carbon (a-C:H) films provide low friction, extreme hardness, chemically inertness, and good biocompatibility. a-C:H films have been expected a surface modification coating to medical appliances. However, poor adhesion of a-C:H film onto medical instruments which is metallic material limits their application. In order to improve the adhesion, the most...
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