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Nd-Fe-B films with Ta and Mo additions used as buffer and capping layers and as interlayers have been deposited by r.f. sputtering on heated Si(111) substrates at 370°C and 470°C, and subsequently annealed at temperatures between 550°C and 650°C. In comparison with the Ta/NdFeB/Ta film, the Mo/NdFeB/Mo film deposited at 470°C presents an obvious anisotropic character. Very good anisotropic magnetic...
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