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Reliability Qualification has historically been a time consuming affair, taking up several months in each technology node's development cycle. The recent introduction of High-K/Metal Gates (HKMG) and the additional complexity they bring to the gate stack have placed increased demands on reliability and the reliability feedback for gate stack definition. It is demonstrated that these demands can be...
Extensive breakdown measurements with large statistic confirm that the TDDB failure distribution follows Poisson area scaling. However, towards larger areas and lower failure percentiles the distribution changes in ways similar to those reported for progressive breakdown in poly Si/SiON gate stacks. The change in failure distribution is found to be more pronounced for nFET than for pFET devices. In...
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