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This paper proposes a novel vertical MOSFET with the middle partial insulation and block oxide (bMPI) structure for 1T-DRAM application. The bMPI 1T-DRAM can increase the pseudo-neutral region due to the bMPI under the vertical channel and its device sensing current window is improved about 95% when compared to the planer bMPI 1T-DRAM. Because of the double gate structure, the proposed device has...
SOI FinFET transistors have emerged as novel devices having superior controls over short channel effects (SCE) than the conventional MOS transistor devices. However despite these advantages, these also exhibit certain other undesirable characteristics such as corner effects, quantum effects, tunneling etc. Usually, the corner effect deteriorates the performance by increasing the leakage current. In...
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