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A universal route for manipulating polymer semiconductors physically and chemically orthogonal to the sequential solution coating and etching processes that are involved in conventional photolithography, which is termed an orthogonal polymer semiconductor gel, is demonstrated by Moon Sung Kang, Hojin Lee, Do Hwan Kim, and co‐workers in article number 1901400. Ultimately, the proposed strategy is expected...
A universal method that enables utilization of conventional photolithography for processing a variety of polymer semiconductors is developed. The method relies on imparting chemical and physical orthogonality to a polymer film via formation of a semi‐interpenetrating diphasic polymer network with a bridged polysilsesquioxane structure, which is termed an orthogonal polymer semiconductor gel. The synthesized...
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