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Our previous studies on AlN microstructures have shown that smooth amorphous films (a-AlN) can be grown on negatively biased Si substrates by the versatile physical vapour deposition technique under reactive magnetron sputtering. These a-AlN films are produced by energetic Ar ion bombardment under negative bias whereas those grown without bias were columnar crystallized ones (c-AlN). Here, we show...
Bi 4−x La x Ti 3 O 12 (BLT x ), (x=0 to 1) thin films were grown on silicon (100) and platinized substrates Pt/TiO 2 /SiO 2 /Si using RF diode sputtering, magnetron sputtering and pulsed laser deposition (PLD). Stoichiometric home-synthesized targets were used. Reactive sputtering was investigated in argon/oxygen gas mixture, with a pressure...
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