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An electromechanical tunable grating was fabricated by micromachining a GaN crystal grown on a Si substrate. The tunable grating consisted of an expandable freestanding grating and an electrostatic comb-drive actuator. In order to compensate the residual stress of the GaN crystal grown on the Si substrate, crystallization stress of an HfO2 layer deposited on the GaN crystal was utilized. The freestanding...
A tunable grating is fabricated by micromachining a GaN crystal layer grown on Si substrate. The tunable grating consists of grating lines, electro-static comb-drive actuator and connection springs. The grating consists of 85nm wide, 12μm long 24 grating lines with 674nm period. The crystallization stress of an HfO2 layer deposited on the GaN crystal is used to compensate the residual stress of the...
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