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Studying on the eluting and adsorpting the saturated ANJ.SiC by different regenerants, NaOH is the most suitable one. The influence of the factors containing NaOH concentration, elution time and regeneration times on ANJ.SiC regeneration rate was studied. The results show that the best NaOH concentration is 0.5mol/L, with the regeneration rate of 115.83%; the best elution time is 60min, with the regeneration...
An atomic force microscope was used to directly measure the sidewall roughness of silicon on insulator (SOI) rib and silicon carbide waveguides. In order to make the vertical walls accessible, the chip containing the ribs was fixed on a 15?? steel wedge and loaded onto an AFM scanner stage; this fitting ensures enough probe contact area on one of the sidewalls. The data was processed using a fully...
We present a novel silicon-based micro-lens system actuated by electro-wetting including a lens centering mechanism and taking advantage of silicon dioxide dielectric layers and low surface roughness of standard MEMS-processes
Only recently, a technique to manufacture optical fibre nanowires with sufficiently low propagation losses for optical applications has been published. Due to the small surface roughness and high diameter uniformity required to achieve low propagation losses, to date the totality of work in the area has focused on the production of silica optical fibre nanowires. Here we report what we believe to...
In this work, an approach was made to use chemical mechanical polishing (CMP) by prototype fixed abrasive (FA) pads rather then conventional slurry based polishing for smoothing of bulk micro-machined and oxidized silicon wafers. A comparison is provided to conventional CMP, showing the minimization of edge rounding in case of FA use under the needed polishing step for sub-sequent wafer bonding. Simultaneously...
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