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High quality a-Si/sub 1-x/C/sub x/:H films can be prepared by catalytic chemical vapor deposition (Cat-CVD) method by using both graphite catalyzer and C/sub 2/H/sub 2/ gas as carbon source. Stable fabrication of a-Si/sub 1-x/C/sub x/:H films by Cat-CVD method using tungsten or tantalum wires, which are easily broken by carbonization, has been difficult so far for stable deposition. Using graphite...
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