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Pinch dynamics of the imploding plasma and its relations with the 13.5 nm extreme ultraviolet (EUV) emissions have been experimentally investigated for a laser assisted Sn based discharge produced plasma (LA-DPP) EUV source. Plasma behaviors during the discharge are clarified using the laser aided shadowgraphic technique. Temporally and spatially resolved electron density distributions obtained by...
Extreme ultraviolet (EUV) radiation with wavelengths of 11 to 14 nm is seen as the most promising candidate for a new lithographic technology. Compared to synchrotron radiation sources and laser produced plasmas, gas discharge produced plasma (GDPP) sources for EUV radiation are expected to offer lower cost of ownership. This paper describes the dependence of EUV emission on gas flow rate. Using xenon...
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