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The effect of UV irradiation on ZnO thin film based gas sensor was investigated. Zinc oxide thin films were deposited on an alkali free glass substrate by magnetron sputtering system using zinc target. The UV irradiation of the ZnO thin films was measured to understand the change of microstructure, electrical properties, optical properties and gas sensing characteristics. The X-ray diffraction patterns...
Using the magnetron sputtering technology, high quality Al2O3-based textured ZnO thin films (Al2O3/ZnO) which can be applied to solar cells' light trapping effect were fabricated by controlling the preparation parameters properly. X-ray diffraction (XRD) and Scanning electron microscopy (SEM) results show that O2 /(Ar+O2) flow ratio has great influence on Al2O3/ZnO films surface morphology during...
In this work are discussed the technology for preparing and characterisation of indium-tin oxide (ITO) and ITO with titanium oxide underlayer thin films with properties appropriate for usage at elevated temperatures as heat reflective coatings and gas sensors. For preparing the samples the methods of radio frequency (RF) and DC-magnetron reactive sputtering were used. Sputtering of indium-tin and...
An amorphous silicon suboxide was synthesized by co-sputtering of Au and SiO2 using RF magnetron sputtering. The extracted data from XRD, SEM as well as EDX were utilized to characterize the surface of the thin film samples.
Nanostructured copper was deposited on oxidised p-type (100) single crystal silicon using radio frequency (RF) sputtering technique. The morphology and crystal orientation of the deposited films were examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD), respectively. Corrosion behaviour of these films was studied by potentiodynamic polarisation and electrochemical impedance spectroscopy...
CuInS2 thin films have been prepared by one-step DC reactive sputtering process. Full characterizations have been carried out by EDS, XRD, SEM, optical transmittance and electrical measurement. XRD and SEM analysis of the films show that the crystallinity and morphology could be improved by altering the composition of the films to stoichiometric. The band gaps of samples with different Cu/In ratio...
Summary form only given. Titanium nitride films are extensively used in numerous industrial areas owing to their superior mechanical properties such as high abrasion resistance, low friction coefficient, high temperature stability and high hardness. The mechanical properties of TiN film are strongly related to its preferred orientation. This work reports the deposition of poly crystalline and hard...
This study reports on carbon and tungsten deposition on a heated silicon substrate under He+ bombardment in a magnetron sputtering device. The discharge was operated at constant pressure of 1.33 Pa for two discharge current intensities (200 mA and 600 mA) and target power density up to 40 Wcm-2. The deposited films were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM)...
The precursor Zn3N2 films were deposited on quartz glass substrates by reactive DC magnetron sputtering and oxidized in situ at various temperatures by introducing pure oxygen gas directly into the deposition chamber. X-ray diffraction (XRD), scanning electron microscopy (SEM), UVNIS transmittance, Hall-effect measurements and photoluminescence (PL) were carried out to investigate the structural,...
Vanadium doped ZnO films with the doping concentration of 0.8% were deposited onto glass substrates at different sputtering pressures by direct current (DC) reactive magnetron sputtering using a zinc target doped with vanadium. The effect of the sputtering pressures (5*10-3 - 3*10-2 mbar) on the structural properties of the deposited films have been studied by X-ray diffraction (XRD), scanning electron...
We deposited ZnO thin Alms on single-crystal p-type Silicon <100> substrates by direct current (DC) magnetron sputtering method. The ZnO thin films deposited at room temperature by DC magnetron sputtering were annealed, when powers were 60, 90 and 120W, and temperature were 400, 500, 600 and 700 degC respectively. Analyzed microstructure of the ZnO thin films by X-ray diffraction (XRD).Observed...
We investigated in this study structural and nanomechanical properties of zinc oxide (ZnO) thin films deposited onto langasite substrates at 200degC through r.f. magnetron sputtering with an r.f. power at 200 W in an 02/Ar gas mixture for different deposition time at 1, 2, and 3 h. Surface morphologies and crystalline structural characteristics were examined using x-ray diffraction (XRD), scanning...
Highly c-axis-oriented and fine structural AIN films were successfully prepared on Langasite substrate (LGS, La3Ga5SiO14) by RF magnetron sputtering. The crystalline structure of the films was determined by X-ray diffraction (XRD) and the surface microstructure of films was quantitatively investigated by using scanning electron microscope (SEM) and atomic force microscope (AFM). Different sputtering...
Highly (002) oriented aluminum nitride (AlN) films were successfully prepared on a 64deg-YX LiNbO3 substrate by r.f. magnetron sputtering. The crystalline structure of the films was determined by grazing incident angle X-ray diffraction (XRD) and the surface microstructure of films was investigated by Scanning electron microscope (SEM). The atom composition ratio (Al/N) of the films was also determined...
The ZnO:Al thin films were prepared by RF magnetron sputtering on Si substrate using Pt as interdigitated electrodes. The structure was characterized by XRD and SEM analyses, and the ethanol vapor gas sensing as well as electrical properties have been investigated and discussed. The gas sensing results show that the sensitivity for detecting 400 ppm ethanol vapor was ~20 at an operating temperature...
A Bragg mirror structure is an essential part for vertical cavity surface emission laser (VCSEL) applications. High optical reflectance at required stopband width is one of major concern by means of application requirements. For this purpose, Bragg mirrors consisting of SiC/MgO multilayers have been developed using an RF magnetron sputtering technique at room temperature. These structures have been...
This paper describes the ohmic contact formation of polycrystalline 3C-SiC thin-films deposited on thermally grown Si (100) wafers. In this work, the TiW (titanium tungsten) film as a contact material has been deposited by RF magnetron sputter and annealed with vacuum furnace process. The specific contact resistance of the TiW contact was measured by using the C-TLM (circular transmission line method)...
This paper presents a new method for BaM thin films having a negative nucleation field, consequently high squareness of film. Bi-layered BaM thin films were deposited by rf sputtering with high purity Ar and O2 gases on single crystal sapphire (000l) substrates. The bi-layer is composed of amorphous as a top layer and crystalline BaM films. A three-step rapid temperature annealing (RTA) was performed...
Aluminum-doped zinc oxide (ZnO:Al) films were deposited by RF magnetron on p-Si(111) substrates to fabricate Al-doped/p-Si heterojunctions. The structural and electrical properties of the Al-doped ZnO films were characterized by X-ray diffraction spectroscopy (XRD), scanning electron microscopy (SEM) and Hall effect measurement, respectively. The results show that Al-doped ZnO thin films have high...
In order to study antibacterial properties of nanometer TiO2 thin films, nanometer Fe3+-TiO2 films have been prepared on glass by RF magnetron co-sputtering method. The films were characterized by SEM, XRD, and XPS. The influence of Fe element and calcination temperature on the films structure was investigated. The principle of substitution impurity to improve the activity was discussed. The bactericidal...
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