The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
The FePt(30 nm)/MgO bilayer films with various MgO(200) underlayer thicknesses of 0 to 30 nm are in-situ deposited on Si substrates. A weak (111)FePt peak as well as strong (001)FePt and (002)FePt peaks are observed in XRD pattern of single-layered FePt film with no MgO underlayer. When a 5 nm thick MgO film is introduced under the FePt film, the (111)FePt peak almost disappears and both the (001)...
RF magnetron sputtering gas pressure and substrate temperature on Al-doped ZnO (ZAO) thin film optical performance has important implications. Al-doped ZnO (ZAO) thin films were prepared by RF magnetron sputtering technology. We realized ZAO films with the better performance by adjusting and optimizing the sputtering gas pressure and substrate temperature. Using UV-vis spectrophotometer tested the...
Cr/CrN nano-multilayers have been produced by varying the period and the degree of unbalancing in a magnetron sputtering system in order to study the influence of these parameters in the electrical properties. X-ray Diffraction (XRD) was used to investigate the microstructure characteristics of the multilayers and the Four Point Probe (FPP) technique in the Van der Pawn mode was used to evaluate electrical...
In this work are discussed the technology for preparing and characterisation of indium-tin oxide (ITO) and ITO with titanium oxide underlayer thin films with properties appropriate for usage at elevated temperatures as heat reflective coatings and gas sensors. For preparing the samples the methods of radio frequency (RF) and DC-magnetron reactive sputtering were used. Sputtering of indium-tin and...
Multilayer oxide thin film stacks of aluminum doped zinc oxide (AZO) and tin doped indium oxide (ITO) have been sequentially deposited on soda lime glass substrates by RF sputtering of AZO and ITO ceramic targets at a substrate temperature of 150??C. The ratio of the AZO thickness to the ITO thickness is varied while keeping the total thickness of the stack constant. The electrical and optical properties...
We deposited ZnO thin Alms on single-crystal p-type Silicon <100> substrates by direct current (DC) magnetron sputtering method. The ZnO thin films deposited at room temperature by DC magnetron sputtering were annealed, when powers were 60, 90 and 120W, and temperature were 400, 500, 600 and 700 degC respectively. Analyzed microstructure of the ZnO thin films by X-ray diffraction (XRD).Observed...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.