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In this work, we have successfully prepared TiO2 thin films doped with various concentration of NbCl5. The doping concentrations were varied from 0.0 mol%, 0.1 mol%, 0.2 mol%, 0.3 mol% and 0.4 mol%. The characterizations were done by means of electrical properties and surface morphology. The results show that as the concentrations of NbCl5 increased, current escalates. For surface morphology, the...
Titanium Dioxide (TiO2) thin films have been successfully deposited on glass substrate using sol-gel method. The samples were then annealed in a furnace under different oxygen gas flow rate. Current-Voltage (I-V) measurement, SEM, and UV-Vis characterization are done for all samples. SEM images confirm the nanostructured nature of the thin films. The sample with higher oxygen flow rate shows significant...
Lead Titanate (PbTiO3) thin films derived from metal alkoxide precursor solution through sol-gel method were deposited onto silicon substrates by dip coating. These films were deposited at different immersing times. The withdrawal speed on the other hand was fixed at 7 mm/s. The dielectric properties of these thin films were investigated as a function of frequency. The IV characteristics and micro-structural...
Titanium dioxide thin films were prepared by sol-gel method on Si (110) substrates after annealed at 650 degC. Schottky diodes of Cr/TiO2, Au//TiO2 and Ni/TiO2 were fabricated by RF magnetron sputtering, and the electrical properties of the diodes were investigated. The effective barriers Phib and ideal factors n were calculated from thermionic emission model, and it was found that the height of Schottky...
The heterolayered thick/thin structure consisting of Pb(Zr0.52Ti0.48)O3 (PZT) and SrTiO3(ST) were fabricated by a sol-gel process. We investigated the effect of phase, composition, and interfacial state of SrTiO3 thin films layer at interface between PZT thick films. The structural and the dielectric properties were investigated for effect of various stacking sequence of sol-gel-prepared SrTiO3 layer...
Three methods for fabricating thin film capacitors are investigated using sputtering, sol-gel, and atomic layer deposition (ALD) techniques for advanced packaging applications for embedded capacitors. In particular, the microstructures and the electrical properties of ceramic oxide films Au/Ti/Al2O3 for ALD are being studied while ferroelectric thin films Au/Ti/BaTiO3 for sol-gel and Cu/Ba1-XSrXTiO...
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