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AFM, Raman spectroscopy, FTIR spectroscopy and Hall effect measurements were used to analyze nanocrystalline diamond film. The surface structure and conductivity as well as CH stretching bonds of the film was demonstrated.
Summary form only given: A diamond thin film has many attractive properties such as high hardness, large heat conductivity etc. Microwave plasma chemical vapor deposition (MWPCVD) is an effective method for producing a diamond thin film. However, the deposition rate of the conventional low-pressure MWPCVD is very low. Recently, the authors have succeeded to produce a diamond thin film on a Si substrate...
Nanodiamond (ND) particles (4-8-nm) have been deposited by an electrophoretic method on aluminium alloy A319 to obtain thick (20-60-m), strongly adherent coatings. The electrophoresis deposition process was carried out by dispersing ND powders in an electrolytic solution of nickel sulphate/nickel chloride solution to obtain Ni-ND composite coating and also in isopropanol to obtain Ni-free ND coating...
Polycrystalline diamond films have unique properties for applications in advanced electronic devices. Undoped and doped polycrystalline diamond films are deposited on p type Si (100) and n type SiC (6H) substrates at the low surface deposition temperatures of 370deg - 530degC using a microwave plasma enhanced chemical vapor deposition (MPECVD) system in which the surface temperatures during deposition...
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