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Nanodiamond with dielectric strength greater than 2MV/cm was grown by microwave plasma enhanced chemical vapor deposition and used as a leaky dielectric film for RF MEMS capacitive switches. Nanodiamond films grown by MPECVD were compared with Si3N4 films deposited by RFPECVD by means of transient current measurements. Nanodiamond was characterized by SEM, AFM and Raman spectroscopy for correlation...
Summary form only given: A diamond thin film has many attractive properties such as high hardness, large heat conductivity etc. Microwave plasma chemical vapor deposition (MWPCVD) is an effective method for producing a diamond thin film. However, the deposition rate of the conventional low-pressure MWPCVD is very low. Recently, the authors have succeeded to produce a diamond thin film on a Si substrate...
Nanodiamond (ND) particles (4-8-nm) have been deposited by an electrophoretic method on aluminium alloy A319 to obtain thick (20-60-m), strongly adherent coatings. The electrophoresis deposition process was carried out by dispersing ND powders in an electrolytic solution of nickel sulphate/nickel chloride solution to obtain Ni-ND composite coating and also in isopropanol to obtain Ni-free ND coating...
In this paper, the field emission performances from diamond powders coated with silver has been studied. Scanning electron microscopy, X-ray diffractometry, and Raman spectroscopy were employed in order to determine the morphology, crystal orientation and quality of diamond powder coated with silver
Summary form only given. For wide application of the CVD diamond in output windows of high-power microwave sources it is necessary to establish a CVD process for production of thick diamond films with controlled quality. Currently there are some microwave plasma CVD (MPACVD) reactors at 2.45 GHz frequency which may be used for this purpose. In our experiments polycrystalline high-quality diamond films...
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