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Cr/CrN nano-multilayers have been produced by varying the period and the degree of unbalancing in a magnetron sputtering system in order to study the influence of these parameters in the electrical properties. X-ray Diffraction (XRD) was used to investigate the microstructure characteristics of the multilayers and the Four Point Probe (FPP) technique in the Van der Pawn mode was used to evaluate electrical...
CrNx (0 ≤ x ≤ 0.91) films synthesized using high-power pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission strength...
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