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The paper presents loop closure methodology to disclose the variation window of fab for a technology to robust design for manufacturability. With automatically screened fab raw data, the clean data is collected for many months allowing good prediction of future results for overall fab capability and also used for monitoring fab performance versus design libraries and technology specs to ensure that...
This paper derived a method of modeling litho-constrained layout in design stage. The model applies directly on design layout and does not require mask-synthesis steps. Results show we can capture design-relevant litho "hot-spots" within a matter of an hour on a large full-chip data. This method proves that the hot- spot information is embedded in original design layout and can be extracted...
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