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A new nanopolycrystalline vanadium dioxide (VO2) thin film has been prepared. The thin film is fabricated by reaction-ion sputtering and post-annealing process .The average grain size is 8-10 nm, the phase transition temperature drops down to 35degC, and the temperature coefficiency of resistance (TCR) is -6~7%/K in semiconductor zone. However, the average grain size of conventional microstructure...
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