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We performed in-situ X-ray reflectivity measurements of gold films during sputter deposition on polished silicon substrates. The measurements were performed at several substrate temperatures and under two argon pressures. The gold surfaces were also examined by scanning tunneling microscopy after deposition to obtain their real-space topographic images. These images were used to complement the X-ray...
The intensities of optical spectral lines from excited sputtered atoms under Kr + ion bombardment of a Si target have been measured as a function of oxygen and nitrogen partial pressure. Si I lines are found to be quite sensitive to the presence of O 2 as expected, but not to N 2 up to the pressure of about 10 -5 mbar. Above 10 -5 mbar light intensities...
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