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Ag_2Cu_2O_3 films were deposited on glass and silicon substrates by RF magnetron sputtering of metallic equimolar (Ag_{50}Cu_{50}) alloy target in Ar-O_{2} mixture at different substrate temperature (T_{s}) ranging between 303 and 523 K. The effect of T_{s} on the core level binding energies, structural and electrical properties of the films was systematically studied. The films deposited at room...
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