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Thin titanium oxide films were deposited using a radio frequency (RF) plasma enhanced chemical vapour deposition method. Their optical properties and thickness were determined by means of ultraviolet–visible absorption spectrophotometry. Films of the optical parameters very close to those of titanium dioxide have been obtained at the high RF power input. Their optical quality is high enough to allow...
The aim of this study was to investigate the influence of oxygen concentration in Ar/O 2 gas mixture on the crystalline properties of TiO 2 thin films obtained at low temperature by reactive magnetron sputtering technique. Mass spectrometry of plasma medium provides, in conjunction with XRD and AFM measurements, a guide for attainment of good quality anatase TiO 2 films.
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