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Oblique angle deposited oxide thin films, in which refractive index profiles can be tailored across depth by tuning their microstructure using varying angle of deposition, have opened up new dimensions in fabrication of optical interference devices. Since surface morphology plays an important role for the qualification of these thin film devices for optical or other applications, it is important to...
This work is focused on the investigation of Au/high k/TiN stacks for Resistive Random Access Memories. A screening of high k oxides, commonly used in advanced metal gates, such as HfO 2 and ZrO 2 , is proposed. These oxides were grown on TiN electrodes using Atomic Layer Deposition and Plasma Enhanced Atomic Layer Deposition. The morphological and structural properties of the films...
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