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Thin films of aluminium nitride have been deposited on silicon or alumina substrates by plasma enhanced chemical vapour deposition. The oxidation behavior of these coatings is studied and compared with the behavior of aluminium nitride thick films. We have analyzed the evolution of their optical properties at high temperature by laser spectrophotometry. The complementary characterization methods were...
By means of reactive low voltage ion plating, AlN films were deposited onto unheated BK-7 glass, fused silica, and Si wafers. The obtained films were investigated mainly with respect to possible optical applications. Refractive index and absorption values were determined from spectrophotometric measurements. Hexagonal film structure, high density and smooth film surface and bulk film morphology were...
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