The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
In the 310–790K temperature range, the mechanism of initial oxidation by O 2 is oxide island nucleation and growth. At the lower temperature range, oxygen is first chemisorbed and the oxide nucleates at coverage of ∼0.2. Increasing the temperature causes the oxide islands to nucleate at lower coverage and at 700K and above, the oxide nucleates without any significant stage of chemisorbed oxygen...
The adsorption mechanism and initial oxidation of sputtered beryllium exposed to H 2 O and to O 2 were studied using a combination of the DRS, AES and XPS techniques. For both cases, the clustering Langmuir type mechanism was found to fit the adsorption kinetics. The initial sticking coefficients, estimated from these fits, are S 0(H2O ) 1 and S ...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.