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Indium tin oxide (ITO) films, prepared by a pulsed direct current magnetron sputtering system, are investigated at powers from 0.4 to 2.0 kW (power density in the range 0.8–4.1 W/cm2). It is found that the carrier concentration and crystallinity of the ITO films increase with increasing discharge power, while the electron mobility decreases from 49.2 cm2/Vs at 0.4 kW to 30.3 cm2/Vs at 2.0 kW. X-ray...
Iron films with different thickness were prepared on glass substrate by DC magnetron sputtering. Arrays of α-Fe2O3 nanowires and nanosheets were grown on iron films by thermal oxidation. The morphology and structure of the prepared α-Fe2O3 nanostructures were characterized by SEM, XRD, XPS, Raman and HRTEM. Field emission properties including I-V characteristics, emission uniformity and stability...
In this work are discussed the technology for preparing and characterisation of indium-tin oxide (ITO) and ITO with titanium oxide underlayer thin films with properties appropriate for usage at elevated temperatures as heat reflective coatings and gas sensors. For preparing the samples the methods of radio frequency (RF) and DC-magnetron reactive sputtering were used. Sputtering of indium-tin and...
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