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Radio-frequency magnetron sputtering technique was used in manufacturing thin films of Co doped and (Co, N) co-doped ZnO (Co:ZnO and Co:Zn(N, O)). The sputtering target was a commercial Zn-Co-O compound with 5% Co in weight. The sputtering gas of pure argon was used for Co:ZnO films; and two other different gases, a mixture of Ar and N2 (gas flow-rate ratio 15 : 5 seem) and a pure N2, was used for...
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