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Magnetic thin films of FexN were prepared by so-called "ion reacting deposition." To clarify the effect of ion beam irradiation during deposition, the difference between use of N2 ions and Ar ions was studied. A low-energy broad-beam ion source (Kaufman type) was directed normal to the substrate, which was set obliquely to the direction of iron vapor incidence. All of the FexN films consisted...
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