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We investigate the impact of electronic lithography writing conditions on the performances of two-dimensional grating notch filters fabricated on SiO2/Ta2O5 stack. Field stitching errors as well as electron beam writing step are considered.
Silicon on Insulator is an ideal platform for largescale nanophotonic integration. We show that tight process control is needed for well-functioning filters, and discuss a number of devices based on these filters.
Design and characterization of a new generation of single-photon avalanche diodes (SPAD) array, manufactured by ST-Microelectronics in Catania, Italy, are presented. Device performances, investigated in several experimental conditions and here reported, demonstrate their suitability in many applications. SPADs are thin p-n junctions operating above the breakdown condition in Geiger mode at low voltage...
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