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The electronic structure of C films deposited by sputtering a graphite target in rf. Ar–H 2 plasma is investigated by photoemission, Auger emission and electron energy loss spectroscopy (EELS) as a function of the H 2 concentration in the feed gas, referred to as [H 2 ]. Adding hydrogen to the plasma causes the films to change from a graphite-like unhydrogenated structure to...
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