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p-type transparent and conductive cobalt-nickel oxide films of 130 nm thickness, have been deposited by spin coating method on glass substrates. The electrical and optical properties of the oxides have been studied as a function of the x=Co/(Co+Ni) ratio. A combination of x-ray diffraction, x-ray photoelectron spectroscopy and Raman spectroscopy was used in order to investigate thin film structures...
Nanowire fabrication methods are usually classified either as dasiatop downpsila, including for example photo- or electron beam-lithography, or dasiabottom uppsila, involving the synthesis of nanowires from smaller precursors. Lithographically patterned nanowire electrodeposition (LPNE) combines the attributes of the photolithography approach with the versatility of bottom-up electrodeposition methods...
Being chemically inert and non-toxic and having excellent electrical properties gold is known as one of the most suitable materials for fabrication of long-term implantable electronic devices. In spite of this fact, stability of structures with flash gold finish layers (electroless Ni @ immersion Au or electroless Ni @ electroless Pd @ immersion Au), widely used in electronics packaging, is questionable...
Ni/γ-Al2O3-550 and Ni/γ-Al2O3-800 catalysts (calcined at 550°C and 800°C in the catalyst preparation) were prepared with a impregnation method. Steam reforming of acetic acid as a model compound of bio-oil for hydrogen production had been investigated on the catalysts. The fresh catalysts were characterized by X-ray diffraction (XRD), temperature programmed reduction (TPR-H2) and specific surface...
Microporous silica-based materials SiO2-Al2O3-NiO with a predominant pore size in the range 8-20 Aring, prepared by the sol-gel method by variation in Ni2+ concentrations from 0 to 30 weight %, have been characterized by X-ray diffraction, X-ray photoelectron spectroscopy. The nature of the nickel centers has been studied by magnetic susceptibility measurements supported by the XPS and X-ray experiments...
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