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Nanowire fabrication methods are usually classified either as dasiatop downpsila, including for example photo- or electron beam-lithography, or dasiabottom uppsila, involving the synthesis of nanowires from smaller precursors. Lithographically patterned nanowire electrodeposition (LPNE) combines the attributes of the photolithography approach with the versatility of bottom-up electrodeposition methods...
Being chemically inert and non-toxic and having excellent electrical properties gold is known as one of the most suitable materials for fabrication of long-term implantable electronic devices. In spite of this fact, stability of structures with flash gold finish layers (electroless Ni @ immersion Au or electroless Ni @ electroless Pd @ immersion Au), widely used in electronics packaging, is questionable...
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