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We have been developing original technologies for Localized Plasma Confinement (LPC) CVD method. LPC-CVD method achieves both a high deposition rate and a high conversion efficiency. From the results of IR analysis and Raman spectroscopy for μc-Si i-layer thin films, it was suggested that the combination of high stretching mode fractions in IR spectra and Raman crystallinity may have a correlation...
Silicon and its related alloys deposited by catalytic chemical vapor deposition (Cat-CVD), takes place upon thermo-catalytic decomposition of the reactant gases, i.e. silane (SiH4) and hydrogen (H2), at the surface of a hot filament. Tantalum (Ta) has been used as catalyst which resulted with better controllability from amorphous to crystalline-phase transition. Process for depositing hydrogenated...
AFM, Raman spectroscopy, FTIR spectroscopy and Hall effect measurements were used to analyze nanocrystalline diamond film. The surface structure and conductivity as well as CH stretching bonds of the film was demonstrated.
Hydrogenated silicon (Si:H) thin films were deposited at a selected argon diluting ratio under varied RF power density and the influence of it on nanocrystallization was studied by XRD, FTIR and Raman spectroscopy.
Boron-doped nanodiamond (NCD) films were synthesized on silicon substrates by microwave plasma chemical vapor deposition (MPCVD) technique. The effect of vacuum annealing on the field emission characteristics of NCD films has been investigated. The surface morphology and quality of films was characterized by scanning electron microscope (SEM) and Raman spectroscopy. The SEM images clearly reveal formation...
Thin films of nanocrystalline CuGaS2 chalcopyrites have been prepared by chemical vapor transport (CVT) using elements of Cu, Ga, and S with iodine as the transporting agent. Crystalline layers of CuGaS2 have been grown using various iodine concentrations but with constant source materials, growth zones temperatures and growth durations. The films were grown onto sapphire (Al2O3) substrates. The deposits...
Summary form only given. Successful deposition of nano-phase crystalline TiO2 thin films on polymeric substrates, polymethylmethacrylate (PMMA) and knitted polyethylene (PE) at room temperature was achieved using the dense plasma focus (DPF) device. Deposition was achieved using argon- oxygen gas mixture in the ratio of 9:1 after evacuating the chamber to a base pressure of 10-5 mbar. The working...
This paper describes the possibilities of obtaining nanostructured TiO2 using Spray Pyrolysis Deposition and its application in a solid state solar cell (FTO/ TiO2 In2S3/ CuSbS2/ graphite). Nanostructured TiO2 films are deposited from ethanolic solution of titanium (IV) isopropoxid, (TTIP, 99.99%, Sigma-AIdrich), and acetilacetonate, (AcAc, 99+%, Aldrich); two parameters are proposed for investigation:...
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