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RF magnetron sputtering gas pressure and substrate temperature on Al-doped ZnO (ZAO) thin film optical performance has important implications. Al-doped ZnO (ZAO) thin films were prepared by RF magnetron sputtering technology. We realized ZAO films with the better performance by adjusting and optimizing the sputtering gas pressure and substrate temperature. Using UV-vis spectrophotometer tested the...
Highly c-axis-oriented and fine structural AIN films were successfully prepared on Langasite substrate (LGS, La3Ga5SiO14) by RF magnetron sputtering. The crystalline structure of the films was determined by X-ray diffraction (XRD) and the surface microstructure of films was quantitatively investigated by using scanning electron microscope (SEM) and atomic force microscope (AFM). Different sputtering...
The piezoelectric characteristics of ZnO films obtained by RF magnetron sputtering in reactive plasma have been researched. ZnO films have been grown on SiO/sub 2//Si (100) substrate using a zinc oxide target. Different RF power and reactive plasma have been tested to obtain a good piezoelectric material for SAW applications. Crystalline structures and morphological characteristics of the films were...
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