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We demonstrate a self-assembly process of charged metallic or semiconducting nanoparticles on silicon substrates using conventional photoresist patterning. The self-assembly of nanoparticles is mainly due to a self-electric focusing effect created by the electric field of charged nanoparticles landed on the photoresist patterns. The detailed parameters that affect the focusing effect are investigated...
In this study, we are focusing on the detailed control of the size and density of nanoparticles on the substrate by employing the gas-phase catalyst. To fabricate iron (Fe) nanoparticles as catalyst, Fe(CO)5 gas was used. Size and density of the nanoparticles can be controlled by varying the experimental parameters, such as the molar flow rate, the decomposition temperature and the flow time. Quartz...
In this paper we present a simple but powerful one-step growth method of ultra-long vertically aligned multi-walled CNT (MWNT) array, and its possible applications. Our growth method requires no additional process for catalyst thin film (pre-deposition), and only requires iron chloride powder and acetylene gas. We also present the results of electrical properties of MWNT array, such as electrical...
Atomic force microscopy lithography has been widely used for creating oxide patterns at the nanoscale on a number of different material surfaces. In this work we investigate the formation of uniform oxide lines and layers obtained by assembling arrays of overlapped oxide dots and lines, respectively. Simulations and experiments are conducted in order to assess the uniformity and consistency of the...
SiC nanocrystals growth through the surface reaction between spin-on C60 dissolved in Carbon Disulphide (CS2) and Si substrate and 800degC (100 rains.) annealed has been investigated. Scanning Electron and Atomic Force Microscopy showed the crests of C60 clusters formed preferentially on the Si substrate steps with 40-60 nm cluster sizes. Silicon carbide nanocrystallite formation after anneal. has...
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