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In this article, we report an extensive study of mass density variations with increasing thickness of many nanofilms (Al, AlN, Cr, Cu, SiC, SiO2, Si3N4 and ZnO) deposited on several substrates (MgO, quartz and stainless steel). From, the analysis and the results quantification, it was found that the mass-density dependence showed dispersive behaviours: increasing layer thickness leads to an initial...
Aluminium nitride (AlN) thin films were deposited on a polycrystalline (poly) 3C-SiC layer by a pulsed reactive magnetron sputtering system. The columnar structure of AlN thin films was observed by FE-SEM. The surface roughness of AlN films on the 3C-SiC layer was 9.3 nm. The X-ray diffraction pattern of AlN films on SiC buffer layers was highly oriented at (002). Full width at half maximum of the...
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