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Atomic force microscopy lithography has been widely used for creating oxide patterns at the nanoscale on a number of different material surfaces. In this work we investigate the formation of uniform oxide lines and layers obtained by assembling arrays of overlapped oxide dots and lines, respectively. Simulations and experiments are conducted in order to assess the uniformity and consistency of the...
In this work, we have successfully demonstrated SONOS memories with embedded Si-NCs in silicon nitride by in-situ deposition method. The self-assembly silicon nanocrystals were in-situ deposited within the Si3N4 storage layer by dissociation of dichlorosilane (SiH2Cl2) gas to a high density of 9 times 1011 cm-2. This new structure exhibits larger memory windows for up to 6 V, better program/erase...
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