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AlN x O y thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and...
Titanium carbide thin films have been deposited on both (100) silicon and fused silica substrates by pulsed laser ablating a polycrystalline TiC target. At a KrF excimer laser intensity of about 8x10 8 W/cm 2 , the pulsed laser deposition (PLD) of TiC films was investigated at substrate deposition temperatures ranging from 25 to 600 o C. The structure, surface composition,...
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