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Aluminium tri-iso-propoxide (ATI) is a common precursor for the MOCVD of alumina coatings. However, little is known on its long term stability while its saturated vapour pressure in function of the temperature is controversial. The present contribution deals with these questions through FTIR, TGA and vapour pressure measurements. Low pressure MOCVD from ATI was performed in the temperature range 250–700 °C...
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