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The effect of UV irradiation on ZnO thin film based gas sensor was investigated. Zinc oxide thin films were deposited on an alkali free glass substrate by magnetron sputtering system using zinc target. The UV irradiation of the ZnO thin films was measured to understand the change of microstructure, electrical properties, optical properties and gas sensing characteristics. The X-ray diffraction patterns...
Using the magnetron sputtering technology, high quality Al2O3-based textured ZnO thin films (Al2O3/ZnO) which can be applied to solar cells' light trapping effect were fabricated by controlling the preparation parameters properly. X-ray diffraction (XRD) and Scanning electron microscopy (SEM) results show that O2 /(Ar+O2) flow ratio has great influence on Al2O3/ZnO films surface morphology during...
The precursor Zn3N2 films were deposited on quartz glass substrates by reactive DC magnetron sputtering and oxidized in situ at various temperatures by introducing pure oxygen gas directly into the deposition chamber. X-ray diffraction (XRD), scanning electron microscopy (SEM), UVNIS transmittance, Hall-effect measurements and photoluminescence (PL) were carried out to investigate the structural,...
Vanadium doped ZnO films with the doping concentration of 0.8% were deposited onto glass substrates at different sputtering pressures by direct current (DC) reactive magnetron sputtering using a zinc target doped with vanadium. The effect of the sputtering pressures (5*10-3 - 3*10-2 mbar) on the structural properties of the deposited films have been studied by X-ray diffraction (XRD), scanning electron...
We deposited ZnO thin Alms on single-crystal p-type Silicon <100> substrates by direct current (DC) magnetron sputtering method. The ZnO thin films deposited at room temperature by DC magnetron sputtering were annealed, when powers were 60, 90 and 120W, and temperature were 400, 500, 600 and 700 degC respectively. Analyzed microstructure of the ZnO thin films by X-ray diffraction (XRD).Observed...
We investigated in this study structural and nanomechanical properties of zinc oxide (ZnO) thin films deposited onto langasite substrates at 200degC through r.f. magnetron sputtering with an r.f. power at 200 W in an 02/Ar gas mixture for different deposition time at 1, 2, and 3 h. Surface morphologies and crystalline structural characteristics were examined using x-ray diffraction (XRD), scanning...
The ZnO:Al thin films were prepared by RF magnetron sputtering on Si substrate using Pt as interdigitated electrodes. The structure was characterized by XRD and SEM analyses, and the ethanol vapor gas sensing as well as electrical properties have been investigated and discussed. The gas sensing results show that the sensitivity for detecting 400 ppm ethanol vapor was ~20 at an operating temperature...
Aluminum-doped zinc oxide (ZnO:Al) films were deposited by RF magnetron on p-Si(111) substrates to fabricate Al-doped/p-Si heterojunctions. The structural and electrical properties of the Al-doped ZnO films were characterized by X-ray diffraction spectroscopy (XRD), scanning electron microscopy (SEM) and Hall effect measurement, respectively. The results show that Al-doped ZnO thin films have high...
Poly-crystal zinc oxide (ZnO) films with c-axis [002] orientation have been successfully grown on the strontium (Sr) modified lead titanate ceramic substrates with different Sr dopants by r.f. magnetron sputtering technique. Highly oriented ZnO films with c-axis normal to the substrates can be obtained under a total pressure of 10 mTorr containing 50% argon and 50% oxygen and r.f. power of 70 W for...
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