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RF magnetron sputtering gas pressure and substrate temperature on Al-doped ZnO (ZAO) thin film optical performance has important implications. Al-doped ZnO (ZAO) thin films were prepared by RF magnetron sputtering technology. We realized ZAO films with the better performance by adjusting and optimizing the sputtering gas pressure and substrate temperature. Using UV-vis spectrophotometer tested the...
Multilayer oxide thin film stacks of aluminum doped zinc oxide (AZO) and tin doped indium oxide (ITO) have been sequentially deposited on soda lime glass substrates by RF sputtering of AZO and ITO ceramic targets at a substrate temperature of 150??C. The ratio of the AZO thickness to the ITO thickness is varied while keeping the total thickness of the stack constant. The electrical and optical properties...
We deposited ZnO thin Alms on single-crystal p-type Silicon <100> substrates by direct current (DC) magnetron sputtering method. The ZnO thin films deposited at room temperature by DC magnetron sputtering were annealed, when powers were 60, 90 and 120W, and temperature were 400, 500, 600 and 700 degC respectively. Analyzed microstructure of the ZnO thin films by X-ray diffraction (XRD).Observed...
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