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The effect of plasma assistance during vacuum evaporation was investigated. Silicon films were deposited by e-beam evaporation on Bright Annealed AISI 304 stainless steel and on soda-lime glass substrates at 225/spl deg/C, under 2.28/spl times/10/sup -3/ mbar and e-beam power of 720 W. A low voltage arc was used as a plasma source for ion plating, with argon and argon/hydrogen atmosphere. Structural...
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